SPIE Advanced Lithography + Patterning San Jose, California |
Date |
Presentation |
Presenter |
Location |
February 24, 2025 |
Beyond 3 Sigma: Roughness metrology evolution at the last 20 years (in memory of Ben Bunday) |
Anna Levant |
Convention Center, Grand Ballroom 220B |
February 25, 2025 |
Digital lithography |
Chi-Ming Tsai |
Convention Center, Grand Ballroom 220A |
February 26, 2025 |
Digital lithography technology for the formation of high aspect ratio vias with side wall optimization for dry etch processes on advanced substrates |
Cindy K Mora |
Convention Center, Hall 2 |
February 26, 2025 |
Digital lithography technology for advanced packaging manufacturing |
Anindarupa Chunder |
Convention Center, Room 210A |
February 26, 2025 |
Enabling high resolution pillar patterning using EUV metal oxide resist by functional underlayer design |
Sudha Rathi |
Convention Center, Room 210C |
February 26, 2025 |
Optimization of defect detection sensitivity and cost of ownership reduction in nano imprint lithography through design for inspection and advanced optical inspection |
Oded Ovdat |
Convention Center, Hall 2 |
February 26, 2025 |
Waviness vs. fine roughness: A novel approach to roughness analysis in DRAM processes |
Woosung Jung |
Convention Center, Hall 2 |
February 26, 2025 |
Statistical trend monitoring using inspection-based massively sampled metrological attributes |
Gunsub Shin |
Convention Center, Hall 2 |
February 26, 2025 |
Surface charge mitigation in CD-SEM imaging and measurement of backside power delivery layers |
Printo Joseph |
Convention Center, Hall 2 |
February 26, 2025 |
Innovative approach for roughness characterization of arbitrary polygons |
Pierre Chevalier |
Convention Center, Hall 2 |
February 26, 2025 |
Foundation deep learning model for accurate SEM image segmentation for CD-SEM measurements |
Anna Levant |
Convention Center, Hall 2 |
February 26, 2025 |
Overlay and wafer stress control in semiconductor manufacturing |
Pradeep Subrahmanyan |
Convention Center, Hall 2 |
February 26, 2025 |
Wafer shape control in semiconductor manufacturing |
Pradeep Subrahmanyan |
Convention Center, Room 211B |
February 26, 2025 |
Arbitrary point displacement on B-spline curve |
Jean Franҫois Bougron |
Convention Center, Hall 2 |